MUMBAI: Moser Baer India’s subsidiary Photo Voltaic Technologies India (PVTIL) has completed its deposition trials for Gen 8.5 a-Si (Amorphous Silicon) thin film modules, at its new 40 MW facility in Greater Noida.
 
"This is truly a major landmark for us as it marks the completion of the first project for manufacture of a-Si thin film modules with Gen 8.5 technology. Achieving successful and stable thin film deposition capability for such large size panels in a record time further manifests our technology and project execution capabilities. We commenced equipment trials on schedule in March 2008 and are now on track for commencing commercial production on target," said Moser Baer PV CEO Ravi Khanna.
 
Moser Baer India CFO Yogesh Mathur added, "We see an increasingly significant role for thin film technologies in meeting peaking power requirements and now aim to be a significant player in this segment. The 40 MW thin film facility has met key project objectives and we continue with our significant capacity ramp up plans."

Photo Voltaic Technologies India recently signed a memorandum of understanding (MoU) with a global equipment supplier to secure supply of critical equipment for an additional 565 MW phased expansion of its Thin Film photovoltaic modules manufacturing capacity, which together with the current project capacity of 40 MW will take the total manufacturing capacity to over 600 MW by 2010.

Photovoltaic modules, based on large area thin film technology, provide a potential roadmap to significantly lower the cost of solar energy to consumers.

The demand for thin film based solar modules is expected to grow at a robust pace with increasing applications. Thin film solar modules are ideal for solar farms, rural applications and building integrated Photovoltaic.